photolithography

美 [ˌfoʊtoʊlɪ'θɒgrəfɪ]
英 [ˌfəʊtəlɪ'θɒgrəfɪ]
  • n.照相平版印刷术
  • 网络光刻；微影；微影制程

英汉

英英

网络释义

n.
1.
照相平版印刷术

例句

释义:
全部全部,照相平版印刷术照相平版印刷术,光刻光刻,微影微影,微影制程微影制程
类别:全部全部,口语口语,书面语书面语,标题标题,技术技术
来源:全部全部,字典字典,网络网络
难度:全部全部,简单简单,中等中等,难难
1.
One of the procedures used in making monolithic integrated circuits which overcomes this problem is photolithography based on photoresists.
规程的当中一个被使用在做整体集成电路克服这个问题是石版影印根据光致抗蚀剂。
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2.
that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring.
测试晶圆片-影印过程中用于颗粒计算、量溶解度和检测金属污染的晶圆片。
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3.
One embodiment of the present invention provides techniques and systems for determining modeling parameters for a photolithography process.
一种用于为光刻工艺确定参数的方法，所述方法包括：接收布局；
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4.
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
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5.
Contact-mode photolithography was used for realizing the monolithic integration of 0.
采用光学接触式光刻方式，实现了单片集成0。
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6.
Alignment Precision - Displacement of patterns that occurs during the photolithography process.
套准精度-在光刻工艺中转移图形的精度。
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7.
Influences of side-wall slope of photolithography pattern on characteristic dimensions after ion implantation are analyzed.
分析了光刻图形侧墙斜坡对离子注入后图形特征尺寸的影响。
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8.
A first photolithography process forms first and second diffusion trench openings for the first and second diffusion regions.
第一光刻工艺为第一和第二扩散区形成了第一和第二扩散沟槽开口。
ip.com
9.
The microchannels were firstly constructed on a glass substrate by standard UV photolithography and wet etching technique.
首先，采用紫外光刻和化学湿法刻蚀技术在玻璃基片上加工微米深度的微通道；
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10.
The patterned anodic aluminum oxide (AAO) template was fabricated by UV-photolithography.
采用紫外光刻法制得图案化的阳极氧化铝模板。
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