photomask

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  • n.光掩模
  • Web光罩；光掩膜；遮光膜

E-C

Web Definition

n.
1.
光掩模

Sample Sentence

Definition:
AllAll,光掩模光掩模,光罩光罩,光掩膜光掩膜,遮光膜遮光膜
Category:AllAll,OralOral,WrittenWritten,TitleTitle,TechnicalTechnical
Source:AllAll,DictionaryDictionary,WebWeb
Difficulty:AllAll,EasyEasy,MiddleMiddle,HardHard
1.
These nodes may then be cross mapped from the circuit design onto the chips layout for each of multiple photomask layers within the design.
然后，这些节点从电路设计交互映射到设计中复合光掩模层的每一层芯片布局中。
rán hòu , zhè xiē jié diǎn cóng diàn lù shè jì jiāo hù yìng shè dào shè jì zhōng fù hé guāng yǎn mó céng de měi yī céng xīn piàn bù jú zhōng 。
www.jianzhu668.com
2.
A novel method and system for photomask manufacturing rule check (MRC) were introduced.
介绍了一种较为先进的光罩可制造性规则检查的方法及其系统构成。
jiè shào le yī zhǒng jiào wéi xiān jìn de guāng zhào kě zhì zào xìng guī zé jiǎn chá de fāng fǎ jí qí xì tǒng gòu chéng 。
www.ceps.com.tw
3.
Shown here is a photomask, which bears the patterns that will be printed onto a wafer.
此图显示的就是光掩膜，上面印有将打印到硅晶片上的图案。
cǐ tú xiǎn shì de jiù shì guāng yǎn mó , shàng mian yìn yǒu jiāng dǎ yìn dào guī jīng piàn shàng de tú àn 。
www.eefocus.com
4.
In order to repair the clear defects of photomask, photolytic LCVD process is required to initiate the chemical reactions.
为了对透明光掩模亮场区域进行修补，需要光化学解离过程诱导反应发生；
wèi le duì tòu míng guāng yǎn mó liàng chǎng qū yù jìn xíng xiū bǔ , xū yào guāng huà xué jiě lí guò chéng yòu dǎo fǎn yìng fā shēng ;
www.fabiao.net
5.
determining effective adhesion of photoresist to hard - surface photomask blanks and semiconductor wafers during etching
测定在蚀刻期间光致抗蚀剂同硬表面光掩膜坯及半导体片的有效粘附性
cè dìng zài shí kè qī jiān guāng zhì kàng shí jì tóng yìng biǎo miàn guāng yǎn mó pī jí bàn dǎo tǐ piàn de yǒu xiào zhān fù xìng
www.ichacha.net
6.
Test Method for Calibration Verification of Laser Diffraction Particle Sizing Instruments Using Photomask Reticles
用光掩模原版校准检验激光绕射粒子定尺寸仪器的试验方法
yòng guāng yǎn mó yuán bǎn jiào zhǔn jiǎn yàn jī guāng rào shè lì zǐ dìng chǐ cùn yí qì de shì yàn fāng fǎ
www.mapeng.net
7.
Guidelines for photomask defect classification and size definition
光掩模缺陷分类和尺寸定义的准则
guāng yǎn mó quē xiàn fēn lèi hé chǐ cùn dìng yì de zhǔn zé
www.zftrans.com
8.
Improvement of Development Property of IP Resist on Photomask by Plasma Surface Pretreatment
利用等离子体表面预处理改善光掩模IP胶显影工艺特性
lì yòng děng lí zǐ tǐ biǎo miàn yù chǔ lǐ gǎi shàn guāng yǎn mó IP jiāo xiǎn yǐng gōng yì tè xìng
www.ilib.cn
9.
Specification for round quartz photomask substrates
圆形石英玻璃光掩模基板规范
yuán xíng shí yīng bō lí guāng yǎn mó jī bǎn guī fàn
www.zftrans.com
10.
Advanced Photomask Technology Trend and Development
先进光掩膜技术趋势与发展
xiān jìn guāng yǎn mó jì shù qū shì yǔ fā zhǎn
www.csia.net.cn
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